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The mission of the Almaden Research Center NMR Facility is to develop new measurement techniques and to provide a limited routine service for applications of NMR spectroscopy in the area of information technology related materials problems. At ARC, NMR spectroscopy is used for structure determination/characterization relating to the following materials problems:
Photolithographic Systems
This class of materials includes the polymers, photo-acid generators, small-molecule additives, and casting solvents that make up a photoresist. Quantitative solution-state 13C NMR allows for total component analysis of both bulk resist solutions and processed thin films.
Polymeric Dielectric Materials
Solid-state NMR techniques such as combined Cross-Polarization and Magic-Angle Spinning (CPMAS) are particularly important for the characterization of these materials due to their insolubility in final cured form. NMR spectroscopy is one of the few techniques that can give information on the microscopic chemical structure of these materials as a function of processing conditions.
Head/Disk Interface Materials
Amorphous carbon overcoats and perfluoropolyether lubricants are included in this class of materials. Solid-state 13C NMR has been used to learn about structural variations in amorphous CHx films as a function of sputter conditions. The composition, molecular weight, and decomposition products of perfluoropolyethers can be determined using solution-state 19F NMR techniques.
Polymer and Small-Molecule Synthesis
NMR spectroscopy is the premier tool for the structure elucidation of organic molecules. As such, NMR is routinely used for the characterization of the reactants and products during each step of an organic-synthetic procedure.
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